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Literature

Analog 600 Series Absolute Baratron® Capacitance Manometer Selection Guide

The MKS 600 Series absolute analog Baratron® capacitance manometers are designed for accurate, repeatable pressure and vacuum measurements in demanding production or research process …

Literature

eliteâ„¢ RF Plasma Generators

MKS Instruments eliteâ„¢ RF Plasma Generators - 750, 600, and 300 Watt, 13.56 MHz RF Power Supplies

Manuals

 

Operation manual for the half rack versions of MKS eliteâ„¢ Series 600, and 300 Watt, 13.56 MHz, RF Plasma Generators

Manuals

 

Operation manual for the full rack versions of MKS eliteâ„¢ Series 750, 600, and 300 Watt, 13.56 MHz, RF Plasma Generators

Press Releases

MKS Launches High Power, High Energy Spectra-Physics Industrial Femtosecond Laser

February 4, 2020 - MKS Instruments introduces its Spectra-Physics® Spirit® 1030-140, an industrial femtosecond hybrid fiber laser that delivers >140 W power and >600 µJ pulse energy …

Press Releases

Atotech to participate at the Surface Finishing Mexico

October 11, 2023 – Atotech, a brand of MKS Instruments, will be attending at the Surface Finishing Mexico (SFM) 2023, taking place in Guadalajara, Mexico from October 18 to 19, 202 …

Literature

CV762xH Baratron® Capacitance Manometer Isolation System

The CV762xH Isolation System is designed to automatically maintain a heated 600 Series Baratron® capacitance manometer at vacuum throughout a process cycle. The Isolation System consists …

Literature

DA02B Baratron® Capacitance Manometer with EtherCAT® Communications

Based on the proven E28 and 600 Series absolute analog manometer products, the DA02B meets the current ETG.5003 Semiconductor Device Profile and is designed for use in advanced manufacturing …

Technical Papers

Baratron Capacitance Manometers - Baratron Basics

Learn about the care and maintenance of Baratron® Capacitance Manometers.

Application Notes

CMOS Wafer Processing

The initial step in the CMOS process is the formation of a "pad" thermal silicon dioxide layer on the wafer surface. The pad oxide relieves stress between the substrate and the subsequent …

Technical Notes

Dielectric Thin Films

Thermal SiO2 films for device components can be formed in a variety of ways; the selection of method is dependent on such factors as substrate composition/topography and the thermal …