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ALD, CVD Process High Sensitivity RGA

Specifications

  • Mass Range
    1-100, 1-200, 1-300 amu
  • Ion Source
    High conductance closed ion source
  • Filaments
    Independently replaceable twin Tungsten or Thoria filaments
  • Mass Filter
    Double filter (1 inch "RF only" pre-filter with 4 inch main filter)
  • Detector
    Dual (Faraday and secondary electron multiplier)
  • Maximum Analyzer Operating Pressure
    1e-3 Torr at the ion source inlet (standard), higher pressure optional
  • Minimum Detectable Partial Pressure
    <1e-12 Torr (for total pressures <1e-4 Torr on baseline inlet
  • Minimum Detectable Concentration
    <15 ppb (specified with Argon or Nitrogen for non-interfering peaks)
  • Mass Stability
    Better than ±0.1 amu over 8 hours
  • Resolution
    Better than 10% valley between peaks of equal height throughout the mass range
  • Base Pressure Range
    Maximum inlet pressure can be chosen in the range of 10 mTorr to 10 torr
  • Process Pressure Range
    Maximum inlet pressure can be chosen in the range of 100 mTorr to 760 torr. Please consult the factory for the exact range value closest to your desired pressure. *Inlets for <10 Torr can have optional gas flow acceleration.
  • Mounting Flange
    DN35CF (70mm/2.75'' OD) Conflat® flange. Custom adapters can be provided
  • Vacuum Hardware
    67 l/s turbomolecular pump with high conductance analyzer housing, inlet system, modular UniBloc inlet, automated vacuum control (RVC), completely interlocked and integrated
  • Backing Vacuum System
    Standard: Connected to the tool foreline pump via Surge Protect assembly with a KF16 fitting
    Optional: Independent chemically resistant, dry diaphragm pump with KF16 fitting for connecting the exhaust to a suitable scrubber system
  • Analyzer Housing Base Pressure
    Better than 5e-9 Torr after bakeout
  • UniBloc Maximum Temperature
    Up to 150°C or up to 200°C
  • Bakeout Temperature and Bakeout Jacket
    Included for 180°C bakeout of analyzer chamber
  • Operating Temperature
    70°C (controlled to ±1°C)
  • Weight
    33 lbs. (15 kg) to bolt on Process System
  • Mechanical Support
    Optional stands and brackets are available
  • Mobile RGA Platform
    Optional RGA trolley to improve versatility (footprint 18x24 in., 455x604 mm)
  • Pneumatics
    60-80 psig CDA
  • Electronics Weight on Flange
    1.7 kg
  • Power Requirements
    88-264 VAC, 47/63 Hz, 600 Watts
  • Maximum Operating Conditions
    Electronics: 10-40°C, 80% RH (non-condensing)
  • LED Status Indication
    Interlock status, filament emission, SEM, power and communications
  • I/O Capability
    4 analog inputs and 2 outputs (plus 1 dedicated gauge input). Optional support for a large number of both analog and digital inputs and outputs, including relay control
  • Other Facilities
    Leak check headset socket, external filament trip socket, instrument reset
  • Software
    Process Eye Professional fully network compatible control platform generating under 32bit or 64bit Microsoft® Windows® 7, Server 2016 or Windows 10 (recommended)
  • Communication
    Ethernet CAT-5e
  • PC Requirements
    Intel® i5 3.1Ghz or AMD Ryzen 5 4.4Ghz, 8GB RAM, 512 GB hard drive, dependent upon total number of sensors on the computer and the operating system in use. Multi-sensor installation may require higher specifications.
  • Simultaneous Multi-Sensor
    Process Eye Professional client/server configuration offers flexible multi-sensor operation.
  • RGA to Vacuum System Cable Length
    33 ft. (10 m) standard RGA and 10 ft. (3m) with mobile RGA platform. Other lengths available dependent upon process system and customer requirements
  • Shipping Weight
    132 lbs (60 Kg) may vary depending upon backing pump and instrument rack requirements
  • Compliance
    CE, UKCA

Features

"Smart Head" RGA Technolgy

The Vision 2000-A XD incorporates the Microvision 2 "smart head" RGA technology with a closed ion source and close-coupled inlet. This state of-the-art RGA technology is integrated with the Process Eye Professional control platform, a recipe based, user configurable software program. The combination of a closed ion source and automated inlet allows seamless monitoring of the complete ALD or CVD process cycle, from base vacuum to process pressures up to 760 Torr. By maximizing the ratio between ALD and CVD chamber gas signals and the gas background in the differentially pumped Vision 2000-A XD analyzer housing, the closed ion source enables approximately 15ppb-level detection for trace reaction byproducts and contaminants in the process gas. The closed ion source analyzer is manufactured from vacuum prepared stainless steel and highdensity alumina ceramics and features independently replaceable twin filaments to provide built-in backup in the event of a filament failure. The standard system includes a double filter analyzer to increase the sensitivity of high mass species (for ALD/CVD precursors with high molecular weight), improving contamination resistance and enhancing long-term stability. 

Each Vision 2000-A XD system incorporates a Remote Vacuum Controller (RVC) that provides fail-safe protection for both the process tool and the RGA. It allows full operation and control of RGA system components (filaments, pumps, inlet valves, bakeout, etc.) from the system PC. Available in a compact, remotelymounted rack module the RVC and power supplies. The unit is easily mounted onto any standard 19” tool rack for mounting on a process chamber or other compatible location. Thirty-threefoot (10 m) cables are included as standard so that the probe assembly can be located in a remote position (other lengths are available).

High Temperature Modular UniBloc™ Inlet

The Vision 2000-A XD modular UniBloc is designed to operate at temperatures of up to 200°C for the whole sampling inlet with modular valves and flow elements. All external seals are metal. Many ALD and CVD precursors are liquid or solid at room temperature and may condense, leading to blockage of the gas sampling inlet if the sampling inlet and valve are not at the required temperature. A conformal heating jacket provides uniform temperature control of the whole inlet and valve, eliminating cold spots and preventing precursor condensation, minimizing deposition within the valve and maintaining mobility of sticky or polar gases through the inlet. The high temperature sampling inlet of the Vision 2000-A XD resists blockage and enhances the lifetime of the inlet during sampling of ALD or CVD precursors. If flow element or valve maintenance is required, the new modular design makes it a quick and cost-effective end-user operation, easily performed in the field.

The modular UniBloc was engineered to have minimal internal volume and surface area, reducing surface reactions, and providing fast response to ALD process chemistries. Furthermore, a sample transfer tube can be connected directly onto the face of the modular UniBloc, giving a fast, coaxial flow path from the optimum point of the process equipment to the ion source. From its 1/8" internal compression ferrule connection, users can readily adapt to any choice of tube size and material. The exclusive fast response of the new modular UniBloc inlet manifold allows sampling at both background and process pressures through specific, selected orifices. When not sampling, the inlet valves close and the analyzer is automatically isolated from the process chamber. Optional purging of the inlet is available, flowing inert gas through the mass spectrometer system while not sampling (purge gas does not flow to the process chamber). Such purging is active during bakeout, reducing initial startup time and residual background recovery time.

When sampling gases from >10 Torr, two-stage pressure reduction is provided using bypass pumping. For processes with maximum pressures <10 Torr, low-flow sampling through a single orifice is common, but with performance degradation in ALD applications. With the modular UniBloc inlet, a special configuration is available to draw supplemental sample flow to the inlet via bypass pumping, reducing both sample gas transfer lag and spreading of gas composition changes. In combination with a direct sample transfer tube, this optimizes pulse monitoring.

The inlet valve is operated by integrated electronics and controlled via recipes from Process Eye Professional. The required valve selection is made automatically by a gas independent pressure sensor in the modular UniBloc inlet which also provides a readout of the process chamber total pressure in the Process Eye Professional software.

V-lens™ Technology

ALD and CVD processes typically employ inert gases such as Argon or Nitrogen for precursor carrier gas or purge gas between ALD pulsed cycles. The use of these gases can be challenging as they generate an elevated baseline in RGAs due to large amounts of chemical background noise caused by metastable decay. This results in reduced sensitivity which can be problematic for manufacturers who want to identify changes in trace gases (which are indicative of issues during the manufacturing process) quickly and easily. V-lens technology, a unique enabling solution, helps overcome this issue by providing a consistently low mass independent baseline and detection levels in the low ppb range. This is achieved with unique ion optics that utilize a patented double-focusing and deflection mechanism that significantly reduces background and enhances sensitivity. The result is a gas analyzer with limits of detection in the low ppb range without compromising any other aspect of performance.

This state-of-the-art RGA technology is integrated with Process Eye Professional control platform, a recipe based, user-configurable software program. The combination of V-lens, a closed ion source, and automated inlet allows for sensitive and reproducible monitoring of the complete ALD or CVD process cycle. By maximizing the ratio between ALD and CVD chamber gas signals and the gas background in the differentially pumped analyzer housing, the V-lens and closed ion source enables ppb-level detection for trace contaminants in the process gas.

Process Eye™ Professional Control Platform

The Vision 2000-A XD analyzer uses Process Eye Professional, a highly flexible, modular application operating under 32bit or 64bit Windows 7, Server 2016 or Windows 10. Designed with a "client/server" structure, Process Eye Professional incorporates TCP/IP protocol for full network compatibility. Creating UniBloc inlet valve process recipes is made easy by the recipe wizard function, which allows customized warnings and alarm levels to be triggered whenever the process exceeds preset levels. The Process Eye Professional recipes also specify the way in which the Vision 2000-A XD acquires, displays, and stores data. Other key parameters, such as ion source settings, can be set via the Process Eye Professional recipe. This allows the user to optimize settings for each phase of the process independently. For example, ideal settings for baseline can be set up in the baseline recipe, ideal settings for process monitoring can be set in the process recipe, etc.

Process Eye Professional enhances the Vision 2000-A XD by providing:

  • Automated and intelligent operation of MKS RGAs with fully customizable controls and alarms
  • Recipes for automated calibration
  • Flexible scanning
    Bar Chart, Analog and Peak Jump scanning modes which can be mixed and associated with data trend displays
  • Intelligent, user defined warnings and alarms
    Can include a suggested diagnosis of the fault condition and recommended solution
  • Data displays in relevant units, such as Torr, mbar or Pa in the process chamber
  • Optional ability to read data from other sensors using analog inputs and external events by digital inputs
  • Data buffer for quick on-line review of recent data
  • Full storage of all data for subsequent review and analysis

TOOLweb® RGA

Using the same RGA integration option for process tools, Vision 2000-A XD can be used for all ALD, and CVD process in a completely automated process environment. TOOLweb RGA maintains a constant monitoring of tool activities with all sensor data being framed by wafer logistics before alarm models are applied. Full alarm and data reporting to the FAB host and FDC are available allowing real-time monitoring of chamber conditions and flagging of any process excursions from ideal conditions.

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