Thin film deposition generates by-products which adhere to process chamber walls, resulting in potential process and product contamination. Our Toroidal Remote Plasma Sources for NF3 and fluorine-based gases clean deposits from CVD, PVD, PE-ALD, and ALD process chambers. With high dissociation rates and a proprietary plasma block design, our remote plasma sources provide increased process throughput and repeatable process results. Equipped with EtherCAT® communication to enable data streaming, our remote plasma sources support Industry 4.0.