RPS-CM12P1 Remote Plasma Source for ALD, CVD and PVD Chambers

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Overview

The RPS-CM12P1, 12 kW remote plasma source provides for radical enhanced deposition or selective etch pre-clean processes in Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), or Physical Vapor Deposition (PVD) processes. In chamber clean applications, the RPS-CM12P1 has an increased power range and process gas flow capacity to shorten chamber clean times while maintaining the same footprint as the previous generation remote plasma source Paragon® product.

Compact design enables easy integration to OEM process chambers
Increased Fluorine radical output shortens clean time cycle
EtherCAT® communications provides fast, reliable, data streaming and unit control
A new plasma block assembly results in fast turn maintenance

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Products

		Compare	Description	Compatibility	sortOrder	rankScore	ranking	Drawings, CAD & Specs		Type	Gas Supply During Ignition	Availability	Featured Item	Price		Brand
		RPS-CM12P1-P12C Remote Plasma Sourse, 12kW, ALD, CVD & PVD Chambers 14 Weeks	RPS-CM12P1-P12C Remote Plasma Sourse, 12kW, ALD, CVD & PVD Chambers	UNIVERSAL	0.0	1.0	0.0		0.0	RPS-CM12P1 Remote Plasma Source	Ar	14 Weeks

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Specifications

Type

RPS-CM12P1 Remote Plasma Source
Power Output

12 kW, 3 phase 50/60 Hz, 40 Amps RMS max phase
RF Frequency

400 kHz
Accuracy

±1% to power set point
Gas Supply During Ignition

Ar
NF3 Process Gas

1-12 slm, 1-10 T
NF3 Operation Reactant Output

1-12 slm
Mixed Species Space

30-60 slm

THD

>15%
Inlet Gas Connection

KF40
Outlet Gas Connection

KF50 or KF40
Control Interface

Analog: DB25
Digital: EtherCAT
Dimensions

18.4 x 9.5 x 10.5 in. (46.73 x 24.13 x 26.67cm)
Weight

73 lbs. (33.11 kg)
Compliance

SEMI F47

Features

RPS-CM12P1 Features

Power Architecture
12 kW RF power output
±1% accuracy to power setting
DC boost power regulation
Process
NF3 process for chamber clean
Mixed gas species capable
Supports NF3, O2, N2, Ar
Maintenance
Plasma Electrolytic Oxide plasma block coatings for extended block life, lower operating expenses

RPS-12P1 Remote Plasma Source

A new magnetics design combined with new power boost electronics reduces power losses, enhances ignition repeatability, and increases plasma stability. These design advances also provide improved product reliability and repeatable process performance results. Additional enhancements in the remote plasma source cooling design permit running mixed gas species and high recombination gas species without sacrificing the plasma block life resulting in reduced service cost. An innovative, patent pending control architecture reduces storage capacitance while adhering to SEMI F47 immunity response requirements. Power accuracy of ±1% to the user defined plasma power set point provides lower unit to-unit variation across process chambers.

Equipped with EtherCAT® communication protocols, the RPS-CM12P1 streams key parametric data enabling on-tool or in-fab diagnostics. When the unit does require routine maintenance, servicing the plasma block applicator can be accomplished without removing the power electronics, reducing service times.