Process Sense™ NDIR End Point Detector for Chamber Clean
Overview
The Process Sense endpoint sensor is a small, low-cost SiF4 sensor specifically designed for Remote Plasma Chamber Clean Endpoint detection for silicon-based CVD deposition chambers. Process Sense is based on infrared absorption, the only technique applicable to all plasma cleaning processes (in-situ and remote). It gets mounted onto a bypass on the rough line, ensuring no effect on deposition hardware. The signal level reported by the Process Sense, which is proportional to SiF4 concentration, can be used to determine the completion of the chamber clean process.
- Sensitivity to SiF4 down to 1 ppm
- Simple analog output for reported concentration signal
- Accurate determination of chamber clean endpoint
- Reduced chamber clean times and cost
- Reduced NF3 usage and power consumption
- Increased wafer throughput of CVD tool
Products
| Compare | Description | Drawings, CAD & Specs | Availability | Price | |||
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Clean NDIR Endpoint Sensor, Process Sense™, Non-dispersive Infrared Chamber
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PROCESS-SENSE-NDIR Clean NDIR Endpoint Sensor, Process Sense™, Non-dispersive Infrared Chamber |
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Specifications
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TypeProcess Sense™ NDIR
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Measurement TechniqueNDIR
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Measurement RangeSiF4: 1-200 ppm (at 760 Torr)
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Detection Limit1 ppm SiF4 (at 760 Torr)
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Response Time1 second report rate
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Calibration Accuracy±10%
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Electrical ConnectorDB25 (DB15 adapter available)
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Power Requirements24 VDC (2 amp)
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Dimensions38 x 12 x 13 cm (15 x 4.5 x 5 inches)
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Weight2.5 kg (5.5 lbs)
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Analog OutputAnalog 1: 0-10 V (1x SiF4 concentration)
Analog 2: 0-10 V (20x SiF4 concentration) -
Digital OutputFault signals
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Sample Pressure1-760 Torr
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Sample Temperature25-60°C
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FittingsNW25, NW40, NW50 (others available upon request)
Features
Applications
- Chamber clean endpoint for SiF4
- Silicon Oxides (USG, FSG, PSG, BSG, BPSG)
- Silicon Nitrides
- Polysilicon
- Silane or TEOS processes
Resources
Application Notes
- Chamber Clean Endpoint Control (116.3 kB, PDF)
- Optical Gas Analyzers in Modern Semiconductor Manufacturing (347.7 kB, PDF)
- Infrared Technology for Chamber Clean Endpoint Detection
Drawings & CADs
- ProcessSense™ NDIR Dimensional Drawing (102.5 kB, PDF)
Ultra-High Velocity