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T-Series Advanced IR Gas Analyzer for Process Monitoring
Inline IR Gas Analyzer, T-Series

Specifications

  • Type
    IR Gas Analyzer
  • Measurement Technique
    IR absorption using Tunable Filter Spectrometry
  • Measurable Gases & Vapors
    SiF4, CO2, WF6, and SiF4 & CO2 (dual gas measurement)
    Other gases available (measurement feasibility dependent on sample matrix)
  • Gas Cell Pathlength
    15 cm (standard), contact MKS for custom length
  • Update rate
    1-20 seconds (software configurable)
  • Calibration
    Factory calibrated; no recalibration required
  • Optics Purge Flow
    Dry nitrogen or air
    (required for measurement certain gases; contact MKS)
  • Power Requirements
    120 VAC, 230 VAC, or 24 VDC (2 amp)
  • Dimensions
    Sensor Head: 16.0 x 6.0 x 5.4 in. (407 x 153 x 137 mm)
    (for 15 cm cell with KF40 fitting)
    Control Box: 12.6 x 10.0 x 3.1 in. (320 x 254 x 78 mm)
  • Weight
    7 lbs. (3.2kg)
  • Analog Output
    Analog 1: 0 - 10 V (user configurable)
    Analog 2: 0 - 10 V (user configurable)
  • Sample Pressure
    0.5 - 760 Torr (other ranges available)
  • Sample Temperature
    20 - 60°C
  • Fittings
    NW25 (other sizes available upon request)
  • Fault Indicator
    Digital Output 1
  • Service Port
    Digital Diagnostic Codes
  • Connector
    DB15
  • Communication
    Modbus TCP/IP

Features

True in-process measurement is achieved with the T-Series by employing a single path optical design with the gas cell located between the infrared source and the spectrometer/detector. A variety of sample ports can be accommodated from compression fittings to KF flanges commonly used in semiconductor applications.

The T-Series is a versatile analyzer platform that can be factory configured to monitor or detect various IR active gases from near to mid-infrared at either parts per million capability or percent level sensitivities. With high measurement accuracy, selectivity and multi-component identification, the T-Series is the preferred solution over other spectroscopic techniques for Semiconductor, Specialty Gases and other Chemical process monitoring applications.

Applications:

  • Chamber clean end-point detection
  • Etch process monitoring
  • Gas blending control
  • Chemical process monitoring

Schematic Diagram

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