The 300 mm Resist-Torr® Photoresist Detection Monitor Residual Gas Analyzer is an optimal combination of a closed ion source quadrupole mass analyzer with fast response capillary inlet, and advanced proprietary algorithms developed exclusively for the degas chambers on industry leading 300mm PVD cluster tools. It is often difficult to know when a photoresist problem is affecting the productivity of a 300mm PVD system. Even small amounts of residual resist, when introduced over a prolonged period, can reduce yields, cause particle contamination or slowly contaminate process chambers, thereby requiring premature kit changes. Major photoresist hits can be very costly, upwards of hundreds of thousands of dollars for lost wafers, especially if the tantalum/copper target becomes contaminated.