The AX8575 stand-alone ozone gas delivery system is designed to provide high flow, high concentration, ultra clean ozone generation and delivery. This unit has the highest flexibility to meet the ever changing needs of the semiconductor industry. The AX8575 is a fully integrated, high output ozone gas delivery system specifically designed for use with an increasing number of semiconductor process applications such as Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Tetraethyl Orthosilicate (TEOS)/Ozone CVD (HDSACVD), photoresist strip, wafer cleaning, contaminant removal, and oxide growth. The system can be configured as a multi-channel system delivering ozone for up to 4 channels supporting multiple chambers or multiple tools. The AX8575 is available with an in-rack chiller option for high concentrations. Flow rates of up to 40 slm and concentrations up to 350g/Nm3 can be achieved depending on the configuration of the system.
Compare | Description | Drawings, CAD & Specs | Availability | Price | |||
---|---|---|---|---|---|---|---|
AX8575 Ozone Delivery Subsystem, 40 slm Ozone Delivery Subsystem, In-rack Chiller |
|
Ozone has many advantages over other oxidizers as a strong oxidizing agent. Ozone has a high redox potential, can be generated at the point-of-use, and it decays naturally into oxygen (2O3 ⇒ 3O2). Therefore, it is considered a "green" chemical. If required, ozone can also be destroyed at the output of the process chamber using a catalytic or thermal destruct unit. This significantly lowers the chemical disposal cost, as the output is oxygen and contains no ozone. Ozone is very stable at room temperature, making it a good choice for most applications. Typical ozone applications include ALD, CVD, TEOS/Ozone CVD, photoresist strip, wafer cleaning, contaminant removal, surface conditioning, and oxide growth.
The AX8575 system is configurable with up to four (4) independent channels to support multiple tools or chambers concurrently. Each channel can be matched to the specific concentration and flow required for your specific process. For ultra high concentration processes the system can be configured for up to two (2) channels with an in-rack chiller thereby maintaining the same footprint. The ozone source for each channel is the production-proven AX8407 series ozone generators. It incorporates MKS patented, field proven, high concentration, ultra clean ozone generation technology. The AX8575 includes all subassemblies required for stand-alone operation, including power distribution, an ambient ozone safety monitor and status indicator panel.