The AX8555 Ozone Delivery Subsystem supports multiple chambers or tools to provide ultra clean ozone gas. The AX8555 is a fully integrated, lower flow ozone gas delivery system specifically designed for advanced semiconductor process applications such as Atomic Layer Deposition (ALD). ALD is a self-limiting "pulsed" process that sequentially introduces reactants into the process chamber in the gas phase to build successive monolayers of film on the wafer. By appropriately selecting the precursor materials, parameters such as growth rate, reaction temperature, impurity levels, and crystallinity of the deposited films can be influenced. Films grown using ozone as an oxidizer in ALD are very high quality, stoichiometric, uniform, dense and free from any significant contamination.
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AX8555 Ozone Delivery Subsystem, 0.5 - 5 slm, 4-channel, Standalone |
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For gate oxides and high-k dielectric materials, one of the precursors needs to be an oxidizer. Ozone has many advantages over other oxidizers as a precursor for ALD and as a strong oxidizing agent. Ozone has a high redox potential, can be generated at the point-of-use, and it decays naturally into oxygen (2O3 ⇒ 3O2). Therefore, it is considered a "green" chemical. If required, ozone can also be destroyed at the output of the process chamber using a catalytic or thermal destruct unit. This significantly lowers chemical disposal cost, as the output is oxygen and contains no ozone. Ozone is very stable at room temperature, making it a good choice for most applications. In addition to ALD, typical ozone applications include chemical vapor deposition (CVD), photoresist strip, wafer cleaning, contaminant removal, surface conditioning, and oxide growth.
The AX8555 system is configurable with up to four (4) independent channels to support multiple ALD tools or chambers concurrently. Each channel can be matched to the specific concentration and flow required for your specific process. The ozone source for each channel is the production-proven AX8560 ozone delivery subsystem. It incorporates MKS patented, field-proven, high concentration, ultra clean ozone generation technology, as well as integrated ozone concentration monitor and flow control. The AX8555 includes all subassemblies required for stand-alone operation, including power distribution, an ambient ozone safety monitor, status indicator panel, and optional integrated ozone destructs for each channel.