The RPS-CM12P1, 12 kW remote plasma source provides for radical enhanced deposition or selective etch pre-clean processes in Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), or Physical Vapor Deposition (PVD) processes. In chamber clean applications, the RPS-CM12P1 has an increased power range and process gas flow capacity to shorten chamber clean times while maintaining the same footprint as the previous generation remote plasma source Paragon® product.
Additional CAD file downloads are not available for this product.
RPS-CM12P1-P12C - Drawings
Additional drawings are not available for this product.
RPS-CM12P1-P12C
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