SiF4 and CO2 simultaneous measurement capability
Andover, Mass., November 8, 2022 -- MKS Instruments, Inc. (NASDAQ: MKSI), a global provider of technologies that enable advanced processes and improve productivity, today announced additional measurement capabilities for its T-Series Inline Gas Analyzer.
The T-Series Inline Gas Analyzer now provides simultaneous measurement of SiF4 and CO2 found in semiconductor process byproducts. Using Tunable Filter Spectroscopy (TFS™), a spectroscopic scanning technique capable of generating spectra in the infrared region, the T-Series improves gas identification accuracy and measurement over traditional methods by subtracting out spectra from interferent gases within the same infrared regions. This technology also enables multicomponent measurement. “Expanded compound measurement capabilities, combined with TFS’ highly accurate and simultaneous gas identification, provides customers unparalleled control of critical semiconductor processes,” said Tony Owen, Vice President and General Manager of Controls, Plasma and Reactive Gas.
The T-series Inline Gas Analyzer is ideally suited for chamber clean end-point detection and etch process monitoring in advanced semiconductor processes. Learn more about the product here.
About MKS Instruments
MKS Instruments enables technologies that transform our world. We deliver foundational technology solutions to leading edge semiconductor manufacturing, advanced electronics and specialty industrial applications. We apply our broad science and engineering capabilities to create instruments, subsystems, systems, process control solutions and specialty chemicals technology that improve process performance, optimize productivity and enable unique innovations for many of the world’s leading technology and industrial companies. Our solutions are critical to addressing the challenges of miniaturization and complexity in advanced device manufacturing by enabling increased power, speed and feature enhancement for optimized connectivity. Our solutions are also critical to addressing ever-increasing performance requirements across a wide array of specialty industrial applications. Additional information can be found at www.mks.com
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