Chemical Plasma Source, 3 kW, Sapphire
Model: AX7610S
Chemical Plasma Source, 3 kW, Sapphire
Chemical Plasma Source, 3 kW, Sapphire
Model: AX7610S
Overview
Overview
The AX7610S downstream microwave plasma source is for remote plasma applications with replaceable sapphire plasma tube ideally suited for more severe CF4 CHF3 and NF3 chemistries. The AX7610 downstream source offers configuration flexibility to meet the most demanding application process parameters. The patented conductively-cooled design of the plasma tube supports high throughput and high power (up to 3kW) operation. The wide process window allows for AX7610 use in multiple applications, ranging from fast PR and polymer removal from 300mm wafers to fine-control low-k or atomic layer CVD processes.
Technical Specs
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TypePlasma Source
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Plasma Tube MaterialSapphire
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Maximum Power3.0 kW
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Minimum Water Flow0.35 gpm at 30 psid
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Water Inlet Connection0.375 in. Swagelok®
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Water Outlet Connection0.375 in. Swagelok®
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Electrical Requirements for UV Lamp24 VDC, 1.0 Amp
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Gas Line Connection0.25 or 0.375 in. VCR®
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Output FlangeKF40, KF50 or custom
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For Use WithO2, N2, H2O, Ar, NF3, CF4, C2F6, and other Fluorine-based gases. Operating pressure 2 to 8 Torr typical
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Dimensions15.3 in. (388 mm) length, 1.0 in. (25mm) tube diameter
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Weight10 lb (4.5 kg)
Ultra-High Velocity