Vapor Sublimation Process Traps
Vapor sublimation traps are widely used in silicon nitride LPCVD and Titanium nitride LPCVD processes where significant amount of NH4Cl byproducts have been observed in the foreline. An MKS trap, with its high capacity and high efficiency, reduces process downtime, increases process yield (because of its high flow conductance), and protects the vacuum pump.
Ultra-High Velocity