Semiconductor etching selectively removes material from a thin film on a substrate to create a pattern of that material on the substrate, a critical portion of the semiconductor device fabrication process, where a highly selective etch ensures semiconductor chip quality and yield.
A detailed discussion of the etch processes used in semiconductor manufacturing
Baratron® Capacitance Manometers
For direct, gas independent, high accuracy pressure measurement
Pressure Controllers and Valves
Solutions for vacuum pressure control for improving the productivity of etch processes.
Mass Flow Controllers & Meters
Thermal and pressure based sensor technologies to bring products and processes to market faster, more reliably, and more cost effectively
Remote Plasma Sources
Generate low-energy ions and radicals to react with material surfaces and chamber walls, removing contaminants and act as a precursor for material deposition.
RF Power Generators
RF generators, and impedance matching networks for a complete RF delivery system are vital components of etch processing.
Microwave Generators & Systems
Power and plasma critical for etch and other processes
Quadrupole Mass Spectrometry (QMS) Systems monitor critical etch process conditions
Ozone Generators & Systems
Producing ultra-pure, reliable ozone gas reacting with a wide range of precursor gases to enable Etch (ALE).
Automation Controllers and Modules
Building blocks configured to meet the custom requirements of etch applications.
Fittings and Accessories for Vacuum Piping Systems
High quality vacuum flanges and fittings for etch processing