Search results for "Remote Plasma Sources"
R*evolution® Remote Plasma Source
- Integrated, self-contained unit designed for on-chamber installation
- Quartz plasma applicator, high density for oxygen species
- Up to 6 kW of plasma power
Paragon® 8.0 slm NF3 Flow Intelligent Remote Plasma Source
- Up to 8 slm NF flow, in a compact size enables faster clean times
- Best in Class dissociation (>95%) for efficient uniform cleaning results
- EtherCAT intelligent data reporting for faster, tighter device operation
RPS-CH24P1 Remote Plasma Source for High Flow Applications
- Compact split applicator power design provides easy integration to OEM process chambers
- Increased Fluorine radical output shortens clean time cycles
- EtherCAT® communication enables fast, reliable data streaming and unit control
RPS-CM12P1 Remote Plasma Source for ALD, CVD and PVD Chambers
- Compact design enables easy integration to OEM process chambers
- Increased Fluorine radical output shortens clean time cycle
- EtherCAT® communications provides fast, reliable, data streaming and unit control
Chemical Downstream Plasma Source
- Sapphire or quartz discharge tubes for Fluorine and non-fluorine chemistries
- Patented conductively-cooled design with high power and throughput
- Easy integration
| Compare | Description | Avail. | Price | Qty. | |
|---|---|---|---|---|---|
| AX7610QChemical Plasma Source, 3 kW, Quartz | ||||
| AX7610SChemical Plasma Source, 3 kW, Sapphire | ||||
| SA7610QTZ4Plasma Source Tube Assembly, Quartz, AX7610 | ||||
| SA7610SAPP4Plasma Source Tube Assembly, Sapphire, AX7610 |
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Cleanline® Foreline Plasma Clean System
- Increase tool uptime and productivity
- Improve particle performance
- Improve chamber matching and wafer-to-wafer matching
High Power Microwave Plasma Source
- Higher productivity compatible with 6kW MKS microwave generator
- High power technology enables processes with high output of H* radicals
- Wider operating range and higher flow capability for higher throughput
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KEINOS™ 2 MHz 5 kW, 11 kW & 13 kW RF Plasma Generators
- Dynamic frequency tuning reduces plasma stabilization time
- On-off, level to level and pulse shaping for maximum process flexibility
- Pulse energy control for process repeatability
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