MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, Oxygen, Nitrogen and Hydrogen process ch …
MKS Instruments AX7696MKS-01 R*evolution V Remote Plasma Source (10 SLM Oxygen Flow)
Dimensional drawing for the MKS RPS-CM12P1 Remote Plasma Source for ALD, CVD and PVD Chambers
Dimensional Drawings for the RPS-CH24P1 Remote Plasma Source for High Flow Applications
Provides user information for the connection geometry between ASTRON® remote plasma sources and on the materials of construction of these connections.
ASTRON® Remote Plasma Source Ignition Best Practices
(archive) MKS Instruments R*evolution III Integrated Remote Plasma Source
Optimized Block Coating for the ASTRON® Paragon Reactive Gas Source Platform
MKS Instruments R*evolution III Integrated Remote Plasma Source
This video showcases the key steps in wafer manufacturing, with a focus on the photoresist strip process. It highlights the need for an effective Remote Plasma Source (RPS) to remove …
The RPS-CH24P1, 24 kW remote plasma source is designed for use with larger Atomic Layer Deposition (ALD) and Quad-style Chemical Vapor Deposition (CVD) chambers used in Semiconductor, …
The Paragon remote plasma source is designed for high gas dissociation rates (> 98%) of NF3 with gas flows up to 8 slm and pressures up to 10 Torr.
White Paper: The MKS toroidal remote plasma source (RPS), when incorporated into a semiconductor process tool, delivers primarily neutral radical reactants to a wafer surface, with …
Best Practice for Integration of MKS Instruments ASTRON® Remote Plasma Source
The RPS-CM12P1, 12 kW remote plasma source provides for radical enhanced deposition or selective etch pre-clean processes in Atomic Layer Deposition (ALD), Chemical Vapor Deposition …
Customer Success Story: The Paragon Remote Plasma Source dramatically reduced particle excursions during the chamber cleaning process, clearly outperforming the customer’s former RPS …
R*evolution® III Remote Plasma Source: Low Particle Performance in O2/N2 Photoresist Ashing
Dimensional Drawing for the Paragon® 8.0 slm NF3 Flow Intelligent Remote Plasma Source
MKS Instruments R*evolution V AX7696MKS-01 Remote Plasma Source (10 SLM Oxygen Flow)
Customer Success Story: The MKS RF plasma source solution delivered true pulsing capability, high speed impedance matching, and rapid response to plasma load changes that the customer …
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