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NOVA® Series RF power generators deliver rated output powers of 2,500 or 5,000 Watts at a frequency of 2 MHz. The NOVA Series generators offer advanced RF plasma generation and control for low cost and high yield in the most demanding thin film processing applications. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.