The GHW12 13.56 MHz, 1.25 kW, RF Plasma Generator is ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications. GHW Series RF Plasma Generators are available at 208 VAC and 400/480 VAC. GHW RF plasma generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices. All MKS Instruments' RF Generators are NRTL certified and CE marked.
Additional CAD file downloads are not available for this product.
GHW-50 - Drawings
Additional drawings are not available for this product.
GHW-50
Sign In
Password Reset
Enter your email address below to reset your account password.
Password Reset
Email Verification Required
Cart Items Updated
Remove Product
Remove this product from your comparison list?
Check Order Status
Provide an order number and postal code to check the status of an order or download an invoice for an order that has shipped. Login to view your complete order history.
Sign In Required
To access this and other valuable technical resources, please sign in or register for a new online account.
Add to Cart
RF Plasma Generator, 5.0 kW, 13.56 MHz, GHW Series