842-081 is a specialized replacement High-Pressure Quadrupole (HPQ) Ion Source assembly equipped with tungsten filaments, designed for MKS process monitoring systems. This assembly is specifically engineered to operate in the higher pressure regimes typically found in semiconductor and industrial vacuum processes. It is a user-serviceable, modular assembly. The pre-aligned nature of the filaments ensures that the ion source geometry remains consistent after maintenance, which is critical for maintaining the calibration and quantitative accuracy of the mass spectrometer. The field-proven analyzer technology of the HPQ series allows the ion source to be easily removed for cleaning or replacement. The dual independent filaments can be changed by removing the barrel connectors and loosening the holding screws, allowing for a rapid return to service.

To verify compatibility with specific RGA models, consult the “specifications” section below.