842-061 is a high-durability PVD Off-Axis Ion Source assembly equipped with tungsten filaments, specifically engineered for MKS process monitoring mass spectrometers. This specialized ion source is designed to survive the aggressive environments of Physical Vapor Deposition (PVD) while maintaining high sensitivity for gas analysis. It is designed as a user-serviceable module. The entire ion source can be removed for cleaning, or the filament plate can be replaced individually without the need for specialized jigs or alignment tools. User-serviceable analyzer design allows the ion source to be easily removed and dismantled for cleaning. The off-axis design specifically extends the time between cleanings by shielding the mass filter from the high-flux environment of the PVD chamber.

This ion source is the industry standard for Sputtering, Ion Beam Deposition, and Magnetron Deposition monitoring. It is particularly effective in semiconductor and optical coating workflows where high uptime and low noise floors are required during high-pressure deposition cycles.

To verify compatibility with specific RGA models, consult the “specifications” section below.