842-045 is a high-durability PVD (Physical Vapor Deposition) Ion Source assembly equipped with tungsten filaments, specifically engineered for MKS Microvision and/or e-Vision Residual Gas Analyzers (RGA). This source is optimized for the challenging environments of thin-film deposition and semiconductor manufacturing, where the sensor is exposed to high-pressure process gases and potentially corrosive species.The 842-045 is designed for maximum uptime in industrial 24/7 environments. The source is a user-serviceable module that can be removed as a single unit for cleaning or replacement. The user-serviceable analyzer design allows the ion source to be easily removed and dismantled for cleaning. These PVD sources are specifically engineered to provide stable, long-term performance even when the vacuum environment is rich in deposition materials. This assembly is the primary choice for monitoring Sputtering, Evaporation, and Ion Beam Deposition processes. The tungsten filaments ensure a longer service life when the system is frequently cycled or exposed to the aggressive chemical cleaning agents used in vacuum chambers.

To verify compatibility with specific RGA models, consult the “specifications” section below.