MKS' DI-NH3 is a compact, stand-alone system providing dissolved ammonia water. With Semiconductor 3D IC architectures using new materials like Cu-Co and Si-SiGe, the ability to wet clean with precise alkaline chemistries is growing in frequency and importance. The DI-NH3 delivers dissolved ammonia, providing optimal cleaning capability in an alkaline chemistry, minimizing material loss and contamination and inhibiting Electrostatic Discharge (ESD). Using closed-loop control, conductivity and pressure are kept stable under changing flow conditions. The dissolved ammonia concentration is monitored and adjusted, delivering the specific NH4OH concentration needed. Dissolved ammonia’s alkaline chemistry provides ESD protection during rinsing, particle lift-off, and residual photoresist removal in middle-of-line (MOL) and prevents corrosion of cobalt/copper interfaces.
MKS' DI-NH3 leverages the established and proven architecture of LIQUOZON®, integrating high purity standard materials and safety features in a rugged system to meet the demands of advanced technology manufacturing.
Reliability & Maintenance
Specified achievable dissolved ammonia conductivity in UPW for a system pressure of up to 2.5 barg, UPW temperature of 20°C.
|DI-NH3 Flow [L/min]||DI-NH3 Conductivity [µS/cm]|
N2: Grade 4 (purity .99.99%), dew point <-40°C
Ammonia (NH3): Grade 4.5 (purity .99.995%)
Ultra-Pure Water (UPW): <0.1 ppb metals, <10 particles/ml of 0.1µm size, free of organics
Clean Dry Air (CDA): Filtration, free of oils and particles
Power: 3/PE~, 200 - 208 V } 10 %, 50/60 Hz, collective 1050 W